PRODUCT
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Electronic Industry
Proposal
GPS (Gas-treatment Plasma System)
Application
- Main target process: LFWn and ALD Tin Process
Benefits
- Converts hard powder to either powdered or vaporized form for discharge
- Changing the powder properties (NH4Cl) to NF4Fx reduces the load on the vacuum pump, improving its MTBF
Background
- With the miniaturization of semiconductors, there is a growing trend in the types and usage of highly reactive gases
- Vacuum Pump MTBF can be reduced due to the inflow and reaction of highly reactive gases
- → The Process Up-Time of the Main Tool has decreased and a production bottleneck has occurred
