PRODUCT
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Proposal
Application
- Treatment of IPA and NH3 Gas Emissions from Semiconductor Cleaning Processes
- The environmental impact of NMHC (Nonmethane Hydrocarbon) emissions in various chemical industries
Benefits
- Reduce water usage and wastewater discharge for gas treatment
- Separate management of the tanks for the electrostatic precipitator and wet scrubber
- → Efficient concentration control with minimal water usage
- Combining fine spray and automatic cleaning functions to extend maintenance period
- Address legal regulations on Nonmethane Hydrocarbon (NMHC) emissions
Background
- Isopropyl Alcohol(IPA) is used as a cleaning solution for wafer surface cleaning in semiconductor cleaning processes
- IPA is restricted in atmospheric emissions and can be treated as a substance that can be treated with water,
- but it must be managed below regulatory concentrations and a large amount of water is required for treatment
- → A technology is needed to reduce water usage and improve IPA treatment efficiency